Jianliang Lin

1 ta ish

Colorado School of Mines

1. A comparison of the oxidation behavior of CrN films deposited using continuous dc, pulsed dc and modulated pulsed power magnetron sputtering

   Jianliang Lin, Ningyi Zhang, William D. Sproul +1

   Maqola20122 iqtibos

   ABIABI:AkademIndex/2026.other.269838