S. K. Estreicher

2 ta ish

Texas Tech University

1. Nickel: A very fast diffuser in silicon

   Jeanette Lindroos, David P. Fenning, D. J. Backlund +5

   MaqolaOAOchiq kirish201323 iqtibos

   ABIABI:AkademIndex/2026.other.184730

2. Ti, Fe, and Ni in Si and their interactions with the vacancy and the<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>A</mml:mi></mml:math>center: A theoretical study

   D. J. Backlund, S. K. Estreicher

   Maqola20103 iqtibos

   ABIABI:AkademIndex/2026.other.380052