Keisuke Shibuya

1 ta ish

National Institute of Advanced Industrial Science and Technology

1. Optimization of conditions for growth of vanadium dioxide thin films on silicon by pulsed-laser deposition

   Keisuke Shibuya, Akihito Sawa

   Maqola20152 iqtibos

   ABIABI:AkademIndex/2026.other.363860