Ethan A. Scott

1 ta ish

University of Virginia

1. Thermal conductivity and thermal boundary resistance of atomic layer deposited high-<i>k</i> dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on silicon

   Ethan A. Scott, John T. Gaskins, Sean W. King +1

   Maqola20182 iqtibos

   ABIABI:AkademIndex/2026.other.447595