Sebastian Stach

1 ta ish

University of Silesia in Katowice

1. Evaluation of the Topographical Surface Changes of Silicon Wafers after Annealing and Plasma Cleaning

   Sebastian Stach, Ştefan Ţălu, Rashid Dallaev +3

   Maqola20193 iqtibos

   ABIABI:AkademIndex/2026.other.492994