S. Calderon V.

1 ta ish

International Iberian Nanotechnology Laboratory

1. Low peak power deposition regime in HiPIMS: Deposition of hard and dense nanocomposite Ti-Si-N films by DOMS without the need of energetic bombardment

   Filipe Fernandes, S. Calderon V., Paulo J. Ferreira +2

   Maqola20203 iqtibos

   ABIABI:AkademIndex/2026.other.533907