A. A. Akbarov

1 ta ish

Islom Karimov nomidagi Toshkent davlat texnika universiteti

1. Study of the Distribution Profile for Nickel Implanted in Silicon and the Effect of Annealing on the Structure

   Б. Э. Эгамбердиев, A. A. Akbarov

   MaqolaSilicon and Solar Cell TechnologiesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20212 iqtibos

   ABIABI:AkademIndex/2026.other.392899