Stanislav Ordin

2 ta ish

A.F. loffe Physico-Technical Institute of the Russian Academy of Sciences, Saint Petersburg, Russia

1. Role of the silicon dioxide in formation of higher manganese silicide films

   T. S. Kamilov, A.A. Uzokov, D.K. Kabilov +3

   MaqolaAdvanced Thermoelectric Materials and Devices20042 iqtibos

   ABIABI:AkademIndex/openalex/2004.article.000220

2. Development of thermoelectric detectors on the basis of higher manganese silicide (HMS) films

   T. S. Kamilov, A.A. Uzokov, D.K. Kabilov +5

   MaqolaAdvanced Thermoelectric Materials and Devices20041 iqtibos

   ABIABI:AkademIndex/openalex/2004.article.000218