K. Fröhlich

2 ta ish

1. Preparation of High Permittivity GdScO₃ Films by Liquid Injection MOCVD

   K. Hušeková, M. Jurkovič, K. Čičo +5

   MaqolaSemiconductor materials and devicesECS Transactions20090 iqtibos

   ABIABI:AkademIndex/openalex/2009.article.000169

2. Preparation of High Permittivity GdScO₃ Films by Liquid Injection MOCVD

   K. Hušeková, M. Jurkovič, K. Čičo +5

   MaqolaSemiconductor materials and devicesECS Meeting Abstracts20090 iqtibos

   ABIABI:AkademIndex/openalex/2009.article.000513