Dilshod Normuradov

2 ta ish

Karshi State University, 180103, Karshi, Uzbekistan

1. Structure of МеSi Silicide Films (Me: Li, Rb, K and Cs) According to Electron Microscopy Data and the Diffraction of Slow Electrons

   M.T. Normuradov, A. S. Risbaev, J. B. Khujaniyozov +1

   MaqolaSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20202 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.213643

2. Formation of Barium Silicide Coatings by Vacuum Thermal Evaporation Methods

   Bakhrom Igаmоv, Aleksey Kamardin, I. R. Bekpulatov +3

   Maqolananoparticles nucleation surface interactions20240 iqtibos

   ABIABI:AkademIndex/openalex/2024.article.009014