D.Sh. Juraeva

1 ta ish

Termez State University

1. Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides

   А.С. Рысбаев, S.U. Irgashev, A.S. Kasimov +3

   MaqolaSemiconductor materials and interfacesEurasian journal of physics and functional materials20200 iqtibos

   ABIABI:AkademIndex/openalex/2020.article.001584