You‐Nian Wang

1 ta ish

School of Physics, Dalian University of Technology 1 , Dalian 116024,

1. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

   Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1

   MaqolaPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena20250 iqtibos

   ABIABI:AkademIndex/openalex/2025.article.009577