Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

2 ta ish

Jurnal · ISSN 2166-2746

1. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

   Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1

   MaqolaPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena20250 iqtibos

   ABIABI:AkademIndex/openalex/2025.article.009577

2. Hydrogen adsorption on nitrogen-doped graphene in the presence of water: An atomistic study

   Mirjalol Nosirov, Anora Meyliyeva, Umida Ramazanova +3

   MaqolaHydrogen Storage and MaterialsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena20260 iqtibos

   ABIABI:AkademIndex/openalex/2026.article.005279