Ushbu ish iqtibos qilgan ishlar

54 ta ish

Ish: Tunable defect engineering in TiON thin films by multi-step sputtering processes: from a Schottky diode to resistive switching memory

1. Nanoionics-based resistive switching memories

   Rainer Waser, Masakazu Aono

   Maqola20075 iqtibos

   ABIABI:AkademIndex/2026.other.117990

2. Band alignment of rutile and anatase TiO2

   David O. Scanlon, Charles W. Dunnill, John Buckeridge +12

   Maqola20135 iqtibos

   ABIABI:AkademIndex/2026.other.180614

3. The effect of oxygen vacancy on switching mechanism of ZnO resistive switching memory

   Cong Hu, Qi Wang, Shuai Bai +4

   Maqola20173 iqtibos

   ABIABI:AkademIndex/2026.other.043386

4. Resistive switching memory effect of ZrO2 films with Zr+ implanted

   Qi Liu, Weihua Guan, Shibing Long +3

   Maqola20082 iqtibos

   ABIABI:AkademIndex/2026.other.042951

5. A Low‐Temperature‐Grown Oxide Diode as a New Switch Element for High‐Density, Nonvolatile Memories

   Myoung‐Jae Lee, Sunae Seo, D.‐C. Kim +11

   Maqola20062 iqtibos

   ABIABI:AkademIndex/2026.other.043058

6. High Uniformity of Resistive Switching Characteristics in a Cr/ZnO/Pt Device

   Wen-Yuan Chang, Hsin-Wei Huang, Wei‐Ting Wang +3

   MaqolaOAOchiq kirish20122 iqtibos

   ABIABI:AkademIndex/2026.other.043076

7. A detailed understanding of the electronic bipolar resistance switching behavior in Pt/TiO₂/Pt structure

   Kyung Min Kim, Byung Joon Choi, Min Hwan Lee +6

   Maqola20112 iqtibos

   ABIABI:AkademIndex/2026.other.106081

8. HfO<sub>2</sub>-Based RRAM: Electrode Effects, Ti/HfO<sub>2</sub> Interface, Charge Injection, and Oxygen (O) Defects Diffusion Through Experiment and <italic>Ab Initio</italic> Calculations

   Boubacar Traoré, P. Blaise, Elisa Vianello +3

   Maqola20152 iqtibos

   ABIABI:AkademIndex/2026.other.117996

9. Sarlavhasiz

   Boshqa2 iqtibos

   ABIABI:AkademIndex/2026.other.192861

10. Fabrication and photoresponse of a pn-heterojunction diode composed of transparent oxide semiconductors, p-NiO and n-ZnO

    Hiromichi Ohta, Masahiro Hirano, Ken Nakahara +5

    Maqola20032 iqtibos

    ABIABI:AkademIndex/2026.other.192863

11. Electrical Defects in Silicon Introduced by Sputtering and Sputter‐Etching

    Erik Grusell, S. Berg, L.P. Andersson

    Maqola19802 iqtibos

    ABIABI:AkademIndex/2026.other.192879

12. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192852

13. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192853

14. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192854

15. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192855

16. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192856

17. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192857

18. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192858

19. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192859

20. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192860

21. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192862

22. Sarlavhasiz

    BoshqaOAOchiq kirish1 iqtibos

    ABIABI:AkademIndex/2026.other.192864

23. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192865

24. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192866

25. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/2026.other.192867