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Ish: ABI:AkademIndex/2026.other.668705
Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods
Б. Э. Эгамбердиев, B. Ch. Holliev, A. S. Mallaev +2
MaqolaOchiq kirishSemiconductor materials and interfacesSurface Engineering and Applied Electrochemistry20070 iqtibosABI