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Ushbu ish iqtibos qilgan ishlar
28 ta ish
Ish: New Tight-Binding Method for Simulation of Defect Configurations, Creation and Diffusion Mechanisms in Solids: Application to Silicon
The electrical properties of sulphur in silicon
S. D. Brotherton, Micháel J. King, G.J. Parker
Maqola19816 iqtibosABINegative-U Properties for Point Defects in Silicon
G. D. Watkins, John R. Troxell
Maqola19805 iqtibosABITransferable tight-binding models for silicon
I. Kwon, R. Biswas, C. Z. Wang +2
Maqola19944 iqtibosABIMicroscopic Theory of Atomic Diffusion Mechanisms in Silicon
Roberto Car, Paul J. Kelly, Atsushi Oshiyama +1
Maqola19843 iqtibosABIBarrier to Migration of the Silicon Self-Interstitial
Yaneer Bar-Yam, John D. Joannopoulos
Maqola19843 iqtibosABIHigh-resolution studies of sulfur- and selenium-related donor centers in silicon
Erik Janzén, R. Stedman, G. Grossmann +1
Maqola19843 iqtibosABIIon-solid interactions for materials modification and processing
D. B. Poker, D. Ila, Yaxiong Cheng +2
Maqola19962 iqtibosABITheory of Enhanced Migration of Interstitial Aluminum in Silicon
G. A. Baraff, M. Schlüter, G. Allan
Maqola19832 iqtibosABI