Development the obtaining technology of highest manganese silicide films for thermoelectric microelectric devices
B. Z. SharipovД. М. ШукуроваM.E. AzimovT. S. KamilovTashkent State Technical University, Tashkent (Uzbekistan)Andrey OrekhovV. V. KlechkovskayaRAS, Institute of Crystallography, Moscow (Russian Federation)
2010en
ABI
Annotatsiya
Annotatsiya mavjud emas.
Mavzular
Iqtiboslar va manbalar
0 ta iqtibos0 ta foydalanilgan manba
Koʻrsatkichlar — AkademScholar · Tez orada