Estimation of the sizes of disordered surface regions of Cu and Ag thin films using the ion transmission method
З. А. ИсахановInstitute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent, UzbekistanБ. Е. УмирзаковInstitute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent, UzbekistanМ. К. РузибаеваInstitute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent, UzbekistanZ. E. MukhtarovInstitute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent, UzbekistanA. S. KhalmatovInstitute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent, Uzbekistan
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The dimensions of cluster phases that form on the surfaces of free Cu and Ag films in the case of different irradiation doses are estimated for the first time. It is shown that ion implantation leads to a significant decrease in the number of ions passed through a free film. Under the same conditions of the ion implantation, the concentration of impurity atoms on the surface and their depth-distribution profile for the free film differ noticeably from those for a bulk crystal.
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