Study of the critical angle of channeling of active metal ions through thin aluminum films
З. А. ИсахановInstitute of Ion-Plasma Technologies, Academy of Sciences of Uzbekistan, Tashkent, UzbekistanБ. Е. УмирзаковTashkent State Technical University, Tashkent, UzbekistanS. S. NasriddinovMirzo Ulug’bek National University of Uzbekistan, Tashkent, UzbekistanZ. E. МuhtarovInstitute of Ion-Plasma Technologies, Academy of Sciences of Uzbekistan, Tashkent, UzbekistanR. M. YorkulovInstitute of Ion-Plasma Technologies, Academy of Sciences of Uzbekistan, Tashkent, Uzbekistan
ABI
Annotatsiya
The spatial distributions of ions (K + , Na + ) passed through thin polycrystalline and single-crystalline Al films with the thickness from 180 to 600 Angstrem and critical channeling angles have been studied. The ion energies have been varied within the range E 0 =10-30 keV. It has been shown that an increase in the energy of the primary ion beam leads to a decrease in the width of the maxima of the angular distribution, which is associated with a decrease in the critical channeling angle psi cr . It has been found that the value psi cr does not exceed 4-50 for axial channeling and 9-100 for planar channeling Keywords: critical angle, passage of ions, angular distribution, channeling, spatial distribution.
Mavzular
Identifikatorlar
Iqtiboslar va manbalar
0 ta iqtibos8 ta foydalanilgan manba
Koʻrsatkichlar — AkademScholar · Tez orada