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Ish: Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

1. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

   Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1

   MaqolaPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena20250 iqtibos

   ABIABI:AkademIndex/openalex/2025.article.009577