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Ish: Influence of Accumulation of Impurity Atoms Ni and Fe on the Electrophysical Properties of Si Single Crystals
Dopant microassociation mechanisms in Si〈Mn〉 and Si〈Ni〉
С. З. Зайнабидинов, K. N. Musaev, N. A. Turgunov +1
Maqola20126 iqtibosABI