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Ish: Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor
Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode
Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1
MaqolaPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena20250 iqtibosABI