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Ish: Reflection Spectra Modification of Diazoquinone-Novolak Photoresist Implanted with B and P Ions

1. INDENTATION OF NEGATIVE PHOTORESIST FILMS FOR LIFT-OFF LITHOGRAPHY

   С. А. Вабищевич, Д. И. Бринкевич, В. С. Просолович +4

   MaqolaMetal and Thin Film MechanicsHERALD OF POLOTSK STATE UNIVERSITY Series С FUNDAMENTAL SCIENCES20250 iqtibos

   ABIABI:AkademIndex/openalex/2025.article.001632

2. FILMS OF THE NEGATIVE PHOTORESIST AZ nLOF 5510,IRRADIATED BY ELECTRONS

   S. V. Abramov, Д. И. Бринкевич, В. С. Просолович +5

   MaqolaPolymer Synthesis and CharacterizationHERALD OF POLOTSK STATE UNIVERSITY Series С FUNDAMENTAL SCIENCES20250 iqtibos

   ABIABI:AkademIndex/openalex/2025.article.001986