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Ish: Evaluation of the Topographical Surface Changes of Silicon Wafers after Annealing and Plasma Cleaning

1. Controlling the Low-temperature Ionic Purification of a Silicon Surface by Electron Spectroscopy

   U. B. Sharopov, Kulwinder Kaur, М. К. Курбанов +3

   MaqolaIon-surface interactions and analysisSilicon202111 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.144468

2. Formation of defects on the surface of LiF crystals under irradiation with different ions mass

   Utkirjon Sharopov, Umid Gopparov, K. Yu. Rashidov +8

   MaqolaIon-surface interactions and analysisRadiation effects and defects in solids20229 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.144479

3. Controlling the Low-Temperature Ionic Purification of a Silicon Surface by Electron Spectroscopy

   U. B. Sharopov, Kulwinder Kaur, М. К. Курбанов +3

   PreprintSemiconductor materials and devicesResearch Square20211 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.365538