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Ish: Growth technique and structural properties of the higher manganese silicide films
Electron microscopic investigation of MnSi1.7 layers on Si(001)
Anna Mogilatenko, M. Falke, S. Teichert +3
Maqola20024 iqtibosABIPreparation of manganese silicide thin films by solid phase reaction
Jin‐Liang Wang, Masaaki Hirai, M. Kusaka +1
Maqola19973 iqtibosABIEpitaxial growth of MnSi1.7 layers in the presence of an Sb flux
Yoshinaga Souno, Yoshihito Maeda, Hirokazu Tatsuoka +1
Maqola20013 iqtibosABIThermoelectric properties of manganese silicide films
Qiang Hou, Z.M. Wang, Y. J. HE
Maqola20042 iqtibosABI