Temperature dependence of the resistance of Cu–Cu point contacts over the temperature range 1.5–100 °K
A. I. AkimenkoPhysicotechnical Institute of Low Temperatures, Academy of Sciences of the Ukrainian SSR, Khar’kovA. B. VerkinPhysicotechnical Institute of Low Temperatures, Academy of Sciences of the Ukrainian SSR, Khar’kovN. M. PonomarenkoPhysicotechnical Institute of Low Temperatures, Academy of Sciences of the Ukrainian SSR, Khar’kovI. K. YansonPhysicotechnical Institute of Low Temperatures, Academy of Sciences of the Ukrainian SSR, Khar’kov
ABI
Abstract
It is found that the resistance R (T) of pure (li ≫d) Cu-Cu point contacts is approximately proportional to T4 at 20<T<40 °K[ρ(T)∼T5 for the contact electrodes]. Such a dependence for R(T) agrees well with the results of calculations, if the calculations employ measured point contact electron-phonon interaction functions with subtraction of the background. It is shown that one-phonon umklapp processes produce the major contribution to the point contact electron-phonon interaction (EPI) function.
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