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Work: Study of doping uniformity of a 200 kV ion implanter by RBS and sheet resistance measurements

  1. Simulated annealing analysis of Rutherford backscattering data

    N.P. Barradas, C. Jeynes, R.P. Webb

    Article19975 citations
    ABI
  2. SIMNRA, a simulation program for the analysis of NRA, RBS and ERDA

    M. Mayer

    Article19993 citations
    ABI
  3. Fundamentals of surface and thin film analysis

    L. C. Feldman, James W. Mayer, F. Adams

    Article19892 citations
    ABI
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