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Fundamental processes of radiation modification of semiconductor nanostructures

Flyura DjurabekovaHelsinki Institute of Physics and Department of Physics, University of Helsinki, FinlandХ. Б. АшуровInstitute of Ionic Plasma and Laser Technologies, Uzbek Academy of Sciences, Do'rmon yo'li Str. 33, 100125 Tashkent, UzbekistanС. Е. МаксимовInstitute of Chemistry and Physics of Polymers, Uzbek Academy of Sciences, Tashkent, UzbekistanN. N. TuraevaInstitute of Chemistry and Physics of Polymers, Uzbek Academy of Sciences, Tashkent, UzbekistanБ. Л. ОксенгендлерInstitute of Ionic Plasma and Laser Technologies, Uzbek Academy of Sciences, Do'rmon yo'li Str. 33, 100125 Tashkent, Uzbekistan
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Abstract

Abstract The amount of studies performed in the field of microscopic models of radiation nanophysics is rather limited and, with the exception of carbon nanostructures, they are non‐systematic. The purpose of the present work is to initiate a systematic approach to build the theoretical models of radiation nanophysics with the account for fundamental properties of nano‐objects. We choose at this stage to consider two basic phenomena (Frenkel pair formation and amorphization) modified by only one nanoproperty, i.e. the presence of an interface. We develop a mathematical framework to describe the modification on the nanoscale. From the general expression for the modified radiation phenomena, we find that any radiation effect can be modified at least by 48 ways. This predicts a very rich future of radiation nanophysics both in the fundamental and applied aspects. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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