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Ion Implantation - Tool for Fabrication of Advanced 4H-SiC Devices

Evgenia V. KalininaIoffe Physicotechnical Institute RASG. KholuyanovIoffe Physicotechnical Institute RASYu. A. GoldbergIoffe Physicotechnical Institute RAST. BlankIoffe Physicotechnical Institute RASGrigory OnushkinIOFFE InstituteAnatoly M. Strel’chukA.F. Ioffe Physicotechnical Institute RASG. N. ViolinaElectrotechnical UniversityV. KossovElectron OptronicR. R. YafaevElectron OptronicAnders HallénKTH Royal Institute of TechnologyAndrey O. Konstantinov
Materials science forumbook series2002en
ABI

Abstract

No abstract available.

Topics

Silicon Carbide Semiconductor TechnologiesCopper Interconnects and ReliabilitySilicon and Solar Cell Technologies

Identifiers

DOI
10.4028/www.scientific.net/msf.389-393.835

Citations and references

Cited by 20 references
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