Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Работ: 2

Журнал · ISSN 0734-2101

1. Investigation of the silicon ion density during molecular beam epitaxy growth

   G. Eifler, E. Kasper, Х. Б. Ашуров +1

   СтатьяSemiconductor materials and devicesJournal of Vacuum Science & Technology A Vacuum Surfaces and Films2002Цитирований: 1

   ABIABI:AkademIndex/openalex/2002.article.000106

2. Influence of collision processes in the sheath on ion energy distribution functions in radio frequency discharges

   Yu-Meng Cui, Fang‐Fang Ma, Ziheng Liu +3

   СтатьяPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology A Vacuum Surfaces and Films2025Цитирований: 0

   ABIABI:AkademIndex/openalex/2025.article.005077