Advancements in Photolithography Techniques

Работ: 8

Transverse focusing of electrons in the presence of plane defects terminating at the specimen surface
S. A. Korzh
СтатьяElectron and X-Ray Spectroscopy TechniquesSoviet Journal of Low Temperature Physics1981Цитирований: 0
ABI
Measurement of the internal conversion electron lines by the track counting technique
T.A. Islamov, V. G. Kalinnikov, N. T. Kambarova +6
СтатьяElectron and X-Ray Spectroscopy TechniquesTechnical Physics Letters2001Цитирований: 0
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Measurement of the Background Level in the Spectra of Internal-Conversion Electrons Using the МАС-1 Microscope Complex
D. D. Bogachenko, I. V. Gaidaenko, O. K. Egorov +5
СтатьяElectron and X-Ray Spectroscopy TechniquesInstruments and Experimental Techniques2004Цитирований: 0
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Direct writing with an MeV proton beam: Development and Applications
Vaida Auzelyte
ДиссертацияElectron and X-Ray Spectroscopy TechniquesLund University Publications (Lund University)2006Цитирований: 0
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Prospects for the development of optical systems for nanolithography
А. Б. Бельский, M. A. Gan, I. A. Mironov +1
СтатьяAdvancements in Photolithography TechniquesJournal of Optical Technology2009Цитирований: 0
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Cost efficient master fabrication process on copper substrates
Simone Luigi Marasso, Giancarlo Canavese, Matteo Cocuzza
СтатьяNanofabrication and Lithography TechniquesMicroelectronic Engineering2011Цитирований: 0
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THE VARIOUS COLLINEAR TERNARY FISSION DECAYS IN <sup>252</sup>Cf(sf)
W. von Oertzen, A. K. Nasirov, Yu. V. Pyatkov +1
СтатьяAdvancements in Photolithography Techniques2015Цитирований: 0
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INDENTATION OF NEGATIVE PHOTORESIST FILMS FOR LIFT-OFF LITHOGRAPHY
С. А. Вабищевич, Д. И. Бринкевич, В. С. Просолович +4
СтатьяMetal and Thin Film MechanicsHERALD OF POLOTSK STATE UNIVERSITY Series С FUNDAMENTAL SCIENCES2025Цитирований: 0
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