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Работы, на которые ссылается эта работа
Работ: 28
Работа: New Tight-Binding Method for Simulation of Defect Configurations, Creation and Diffusion Mechanisms in Solids: Application to Silicon
The electrical properties of sulphur in silicon
S. D. Brotherton, Micháel J. King, G.J. Parker
Статья1981Цитирований: 6ABILight-induced metastable defects in hydrogenated amorphous silicon: A systematic study
M. Stutzmann, W. B. Jackson, C. C. Tsai
Статья1985Цитирований: 5ABINegative-U Properties for Point Defects in Silicon
G. D. Watkins, John R. Troxell
Статья1980Цитирований: 5ABITransferable tight-binding models for silicon
I. Kwon, R. Biswas, C. Z. Wang +2
Статья1994Цитирований: 4ABIGenerating Transferable Tight-Binding Parameters: Application to Silicon
L. Goodwin, A Skinner, D. G. Pettifor
Статья1989Цитирований: 4ABIMultiplet splittings and Jahn-Teller energies for the vacancy in silicon
M. Lannoo, G. A. Baraff, Michael Schlüter
Статья1981Цитирований: 3ABIMicroscopic Theory of Atomic Diffusion Mechanisms in Silicon
Roberto Car, Paul J. Kelly, Atsushi Oshiyama +1
Статья1984Цитирований: 3ABIBarrier to Migration of the Silicon Self-Interstitial
Yaneer Bar-Yam, John D. Joannopoulos
Статья1984Цитирований: 3ABIHigh-resolution studies of sulfur- and selenium-related donor centers in silicon
Erik Janzén, R. Stedman, G. Grossmann +1
Статья1984Цитирований: 3ABITheory of hydrogen diffusion and reactions in crystalline silicon
Chris G. Van de Walle, P. J. H. Denteneer, Yaneer Bar-Yam +1
Статья1989Цитирований: 2ABIIon-solid interactions for materials modification and processing
D. B. Poker, D. Ila, Yaxiong Cheng +2
Статья1996Цитирований: 2ABITheory of Enhanced Migration of Interstitial Aluminum in Silicon
G. A. Baraff, M. Schlüter, G. Allan
Статья1983Цитирований: 2ABIDEFECT METASTABILITY IN HYDROGEN PASSIVATED POLYCRYSTALLINE SILICON
N. H. Nickel, W. B. Jackson, N. M. Johnson
Статья1994Цитирований: 2ABIRole of hydrogen complexes in the metastability of hydrogenated amorphous silicon
Статья1990Цитирований: 2ABI