Fragmentation processes of vanadium and niobium oxide clusters sputtered by ion bombardment
Н. Х. ДжемилевInstitute of Ion-Plasma and Laser Technologies, Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanС. Ф. КоваленкоInstitute of Ion-Plasma and Laser Technologies, Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanС. Е. МаксимовInstitute of Ion-Plasma and Laser Technologies, Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanО. Ф. ТукфатуллинInstitute of Ion-Plasma and Laser Technologies, Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanSh. T. KhojievInstitute of Ion-Plasma and Laser Technologies, Academy of Sciences of the Republic of Uzbekistan, Tashkent, Uzbekistan
ABI
Аннотация
The mass distribution of emitted V n O − and Nb n O − clusters and their unimolecular decay by all stoichiometrically possible fragmentation channels, which takes place under the sputtering of niobium and vanadium surfaces and blowing by oxygen, are studied. It is shown that the formation, excitation, and unimolecular fragmentation of V n O − and Nb n O − clusters can be described by a statistical recombination mechanism. Clusters are formed over the target surfaces as a result of binary collisions of independently sputtered ions, atoms, and molecules.
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Показатели — AkademScholar · Скоро