Работы, цитирующие эту работу

Работ: 2

Работа: Dual excitation reactive ion etcher for low energy plasma processing

1. Collisionless magnetized rf sheath resonance heating in dual-frequency capacitively coupled plasmas

   Ming-Yue Han, Fang‐Fang Ma, H. J. Wen +4

   СтатьяPlasma Diagnostics and ApplicationsJournal of Applied Physics2025Цитирований: 0

   ABIABI:AkademIndex/openalex/2025.article.001997

2. Influence of collision processes in the sheath on ion energy distribution functions in radio frequency discharges

   Yu-Meng Cui, Fang‐Fang Ma, Ziheng Liu +3

   СтатьяPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology A Vacuum Surfaces and Films2025Цитирований: 0

   ABIABI:AkademIndex/openalex/2025.article.005077