Работы, цитирующие эту работу

Работ: 2

Работа: Influence of Cr+ ion implantation and pulsed ion-beam annealing on the formation and optical properties of Si/CrSi2/Si(111) heterostructures

1. Raman and IR Spectrum Analysis of CrSi2 Thin Films Formed in Direct Current and Variable Frequency Modes of a Magnetron Sputtering Device

   K.T. Dovranov, Maksim Vinnichenko, V.V. Korablev +3

   СтатьяChalcogenide Semiconductor Thin Films2024Цитирований: 2

   ABIABI:AkademIndex/openalex/2024.article.003101

2. Electrophysical Properties of Nanofilms Produced by Magnetron Sputtering Method

   Dovranov Kuvondik Turakulovich

   ГлаваSemiconductor materials and devicesIntechOpen eBooks2024Цитирований: 0

   ABIABI:AkademIndex/openalex/2024.chapter.000421