Stanislav Ordin

2 та иш

A.F. loffe Physico-Technical Institute of the Russian Academy of Sciences, Saint Petersburg, Russia

1. Role of the silicon dioxide in formation of higher manganese silicide films

   T. S. Kamilov, A.A. Uzokov, D.K. Kabilov +3

   МақолаAdvanced Thermoelectric Materials and Devices20042 иқтибос

   ABIABI:AkademIndex/openalex/2004.article.000220

2. Development of thermoelectric detectors on the basis of higher manganese silicide (HMS) films

   T. S. Kamilov, A.A. Uzokov, D.K. Kabilov +5

   МақолаAdvanced Thermoelectric Materials and Devices20041 иқтибос

   ABIABI:AkademIndex/openalex/2004.article.000218