Advancements in Photolithography Techniques

8 та иш

Transverse focusing of electrons in the presence of plane defects terminating at the specimen surface
S. A. Korzh
МақолаElectron and X-Ray Spectroscopy TechniquesSoviet Journal of Low Temperature Physics19810 иқтибос
ABI
Measurement of the internal conversion electron lines by the track counting technique
T.A. Islamov, V. G. Kalinnikov, N. T. Kambarova +6
МақолаElectron and X-Ray Spectroscopy TechniquesTechnical Physics Letters20010 иқтибос
ABI
Measurement of the Background Level in the Spectra of Internal-Conversion Electrons Using the МАС-1 Microscope Complex
D. D. Bogachenko, I. V. Gaidaenko, O. K. Egorov +5
МақолаElectron and X-Ray Spectroscopy TechniquesInstruments and Experimental Techniques20040 иқтибос
ABI
Direct writing with an MeV proton beam: Development and Applications
Vaida Auzelyte
ДиссертацияElectron and X-Ray Spectroscopy TechniquesLund University Publications (Lund University)20060 иқтибос
ABI
Prospects for the development of optical systems for nanolithography
А. Б. Бельский, M. A. Gan, I. A. Mironov +1
МақолаAdvancements in Photolithography TechniquesJournal of Optical Technology20090 иқтибос
ABI
Cost efficient master fabrication process on copper substrates
Simone Luigi Marasso, Giancarlo Canavese, Matteo Cocuzza
МақолаNanofabrication and Lithography TechniquesMicroelectronic Engineering20110 иқтибос
ABI
THE VARIOUS COLLINEAR TERNARY FISSION DECAYS IN <sup>252</sup>Cf(sf)
W. von Oertzen, A. K. Nasirov, Yu. V. Pyatkov +1
МақолаAdvancements in Photolithography Techniques20150 иқтибос
ABI
INDENTATION OF NEGATIVE PHOTORESIST FILMS FOR LIFT-OFF LITHOGRAPHY
С. А. Вабищевич, Д. И. Бринкевич, В. С. Просолович +4
МақолаMetal and Thin Film MechanicsHERALD OF POLOTSK STATE UNIVERSITY Series С FUNDAMENTAL SCIENCES20250 иқтибос
ABI