Bolometric properties of silicon thin-film structures fabricated by plasmachemical vapor-phase deposition

A method of fabricating uncooled thermally sensitive sandwich structures based on amorphous hydrated silicon films is discussed and experimental results are reported. The structures have an area of 10−4 cm2, a resistance of ≅10 kΩ, and a temperature coefficient of resistance ≃2%/K. At 30 Hz and a current of ≃1 μA, the excess noise exceeds the thermal resistance noise by a factor of 1.7.

Ҳали таржима қилинмаган