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Иш: Effect of Ar+-ion bombardment on the composition and structure of the surface of CoSi2/Si(111) nanofilms
Structure and electronic properties of nanoscale phases and nanofilms of metal silicides produced by ion implantation in combination with annealing
Kh. Kh. Boltaev, Д. А. Ташмухамедова, Б. Е. Умирзаков
МақолаSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201414 иқтибосABIEstimation of changes in parameters of a crystal lattice and energy bands upon variation in the size of nanocrystals and nanofilms of silicides prepared by ion implantation
Б. Е. Умирзаков, Д. А. Ташмухамедова, Kh. Kh. Kurbanov
МақолаSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201112 иқтибосABIPhotoelectron Si 2p spectra of ultrathin CoSi2 layers formed on Si(100)2×1
M. V. Gomoyunova, I. I. Pronin, N. R. Gall +2
Мақола20039 иқтибосABI