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1. Theoretical Explanation of the Effect of a Decrease in the Si(111) Plasmon Energy during the Implantation of Ions with a Large Dose

   А.С. Рысбаев, J. B. Khujaniyozov, M.T. Normuradov +3

   МақолаIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20203 иқтибос

   ABIABI:AkademIndex/openalex/2020.article.000353