Ушбу ишга иқтибос қилган ишлар

2 та иш

Иш: Formation and Schottky behavior of manganese silicides on <i>n</i>-type silicon

1. On the growth of higher manganese silicide films on silicon

   Andrey Orekhov, T. S. Kamilov, Abdumalik Gaibov +2

   МақолаSemiconductor materials and interfacesTechnical Physics20102 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.199251

2. Study of the temperature dependence of the electrophysical and crystal structure of a thin coating of manganese silicide

   B.D. Igamov, A.I. Kamardin, I.R. Bekpulatov +1

   МақолаSemiconductor materials and interfacesMaterials Today Communications20260 иқтибос

   ABIABI:AkademIndex/openalex/2026.article.000612