W. Kreissig

1 ta ish

Fizika-Texnika Instituti

1. High-temperature high-dose implantation of N+ and Al+ ions in 6H-SiC

   R.A. Yankov, M. Voelskow, W. Kreissig +6

   MaqolaSilicon Carbide Semiconductor TechnologiesTechnical Physics Letters19970 iqtibos

   ABIABI:AkademIndex/1997.article.000097