A. N. Efimov

1 ta ish

Fizika-Texnika Instituti

1. On the epitaxy of aluminum nitride on silicon substrates in a chloride-hydride process

   A. N. Efimov, Andrew O. Lebedev, A. Tsaregorodtsev

   MaqolaGaN-based semiconductor devices and materialsTechnical Physics Letters19980 iqtibos

   ABIABI:AkademIndex/1998.article.000132