E.U. Boltaev

1 ta ish

Islom Karimov nomidagi Toshkent davlat texnika universiteti

1. Obtaining of epitaxial films of metal silicides by ion implantation and molecular beam epitaxy

   Б. Е. Умирзаков, Д. А. Ташмухамедова, E.U. Boltaev +1

   MaqolaSemiconductor materials and interfacesMaterials Science and Engineering B200316 iqtibos

   ABIABI:AkademIndex/2003.article.000028