M. Takeda

1 ta ish

Nagaoka University of Technology

1. About the mechanism of formation and growth of the higher manganese silicide films on silicon

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +6

   MaqolaSemiconductor materials and interfaces20053 iqtibos

   ABIABI:AkademIndex/2026.other.424565