Yu. Yu. Yuldashev

1 ta ish

1. Variations in the electronic structure of the silicon near-surface region during implantation of phosphorus and boron ions

   M.T. Normuradov, A. K. Tashatov, А.С. Рысбаев +4

   Maqola200711 iqtibos

   ABIABI:AkademIndex/2026.other.232437