D.Sh. Juraeva

1 ta ish

Termiz Davlat Universiteti

1. Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides

   А.С. Рысбаев, S.U. Irgashev, A.S. Kasimov +3

   MaqolaOAOchiq kirishSemiconductor materials and interfacesEurasian journal of physics and functional materials20200 iqtibos

   ABIABI:AkademIndex/2020.article.001584