T. Kamilov

1 ta ish

Islom Karimov nomidagi Toshkent davlat texnika universiteti

1. Obtaining manganese silicide films on a silicon substrate by the diffusion method

   N. F. Zikrillayev, M. M. Shoabdurahimova, T. Kamilov +4

   MaqolaOAOchiq kirishSemiconductor materials and interfacesPhysical Sciences and Technology202211 iqtibos

   ABIABI:AkademIndex/2026.other.384841