В. М. Ротштейн

2 ta ish

Arifov Institute of Electronics, Academy of Sciences of Uzbekistan, ul. Durmon iuli 33, 100125, Tashkent, Uzbekistan

1. Fragmentation of sputtered vanadium and niobium cluster ions, kinetic release and dissociation energy

   Н. Х. Джемилев, В. М. Ротштейн, О. Ф. Тукфатуллин +1

   Maqolananoparticles nucleation surface interactionsJournal of Analytical Chemistry20110 iqtibos

   ABIABI:AkademIndex/openalex/2011.article.000415

2. Composition and Morphology of A Si(111) Surface with a SiO2 Surface Film of Different Thicknesses

   Б. Е. Умирзаков, S. B. Donaev, R. M. Yorkulov +2

   MaqolaSilicon Nanostructures and PhotoluminescenceSemiconductors20220 iqtibos

   ABIABI:AkademIndex/openalex/2022.article.002267