Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
2 ta ish
Jurnal · ISSN 2166-2746
Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode
Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1
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Mirjalol Nosirov, Anora Meyliyeva, Umida Ramazanova +3
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